AxBAxB… pulsed atomic layer deposition: Numerical growth model and experiments

Modeling the precursor utilization in atomic layer deposition on nanostructured materials in fluidized bed reactors

(2015) Fabio Grillo et al.   CHEMICAL ENGINEERING JOURNAL

Influence of atomic layer deposition valve temperature on ZrN plasma enhanced atomic layer deposition growth

(2015) Triratna Muneshwar et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma

(2015) Triratna Muneshwar et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Analytic expressions for atomic layer deposition: Coverage, throughput, and materials utilization in cross-flow, particle coating, and spatial atomic layer deposition

(2014) Angel Yanguas-Gil et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Mass Transport through the Carrier Gas Boundary Layer in Organic Vapor Phase Deposition

(2014) Cedric Rolin et al.   Physical Review Applied

Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends

(2013) Ville Miikkulainen et al.   JOURNAL OF APPLIED PHYSICS

Interactions between tri-methylaluminum molecules and their effect on the reaction of tri-methylaluminum with an OH-terminated Si (001) surface

(2011) Dae-Hee Kim et al.   APPLIED SURFACE SCIENCE

Atomic Layer Deposition: An Overview

(2009) Steven M. George   CHEMICAL REVIEWS

Growth and Material Characterization of Hafnium Titanates Deposited by Atomic Layer Deposition

(2009) Mihaela Popovici et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Study of the Surface Reactions in ALD Hafnium Aluminates

(2009) L. Nyns et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Density functional theory and beyond—opportunities for quantum methods in materials modeling semiconductor technology

(2008) Sadasivan Shankar et al.   JOURNAL OF PHYSICS-CONDENSED MATTER

Atomic Layer Deposition of Hafnium Oxide from Hafnium Chloride and Water

(2008) Atashi B. Mukhopadhyay et al.   JOURNAL OF THE AMERICAN CHEMICAL SOCIETY

Electrical Properties of Atomic Layer Deposition HfO[sub 2] and HfO[sub x]N[sub y] on Si Substrates with Various Crystal Orientations

(2008) W. J. Maeng et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Applications of atomic layer deposition to nanofabrication and emerging nanodevices

(2008) Hyungjun Kim et al.   THIN SOLID FILMS