Influence of deposition temperature of thermal ALD deposited Al2O3 films on silicon surface passivation

Effect of low thermal budget annealing on surface passivation of silicon by ALD based aluminum oxide films

(2015) Vandana Vandana et al.   PHYSICAL CHEMISTRY CHEMICAL PHYSICS

Blistering Induced Degradation of Thermal Stability Al2O3Passivation Layer in Crystal Si Solar Cells

(2014) Meng Li et al.   Journal of Semiconductor Technology and Science

Si surface passivation by Al2O3 thin films deposited using a low thermal budget atomic layer deposition process

(2013) G. Seguini et al.   APPLIED PHYSICS LETTERS

Effects of Annealing and Atomic Hydrogen Treatment on Aluminum Oxide Passivation Layers for Crystalline Silicon Solar Cells

(2013) Junpei Irikawa et al.   JAPANESE JOURNAL OF APPLIED PHYSICS

Chemical and Morphological Characteristics of ALD Al2O3Thin-Film Surfaces after Immersion in pH Buffer Solutions

(2013) Joel Molina Reyes et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films

(2013) Jörg Haeberle et al.   Beilstein Journal of Nanotechnology

Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells

(2012) G. Dingemans et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Deposition Temperature and Thermal Annealing Effects on the Electrical Characteristics of Atomic Layer Deposited Al2O3 Films on Silicon

(2011) J. M. Rafí et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Excellent silicon surface passivation with 5 Å thin ALD Al2O3 layers: Influence of different thermal post-deposition treatments

(2011) Armin Richter et al.   Physica Status Solidi-Rapid Research Letters

A comparative study of silicon surface passivation using ethanolic iodine and bromine solutions

(2011) Neha Batra et al.   SOLAR ENERGY MATERIALS AND SOLAR CELLS

Origin and passivation of fixed charge in atomic layer deposited aluminum oxide gate insulators on chemically treated InGaAs substrates

(2010) Byungha Shin et al.   APPLIED PHYSICS LETTERS

Influence of the Deposition Temperature on the c-Si Surface Passivation by Al[sub 2]O[sub 3] Films Synthesized by ALD and PECVD

(2010) G. Dingemans et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al[sub 2]O[sub 3]

(2010) G. Dingemans et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Experimental and ab initio infrared study of χ-, κ‐ and α-aluminas formed from gibbsite

(2010) L. Favaro et al.   JOURNAL OF SOLID STATE CHEMISTRY

Advances in crystalline silicon solar cell technology for industrial mass production

(2010) Tatsuo Saga   NPG Asia Materials

High Quality Aluminum Oxide Passivation Layer for Crystalline Silicon Solar Cells Deposited by Parallel-Plate Plasma-Enhanced Chemical Vapor Deposition

(2009) Shinsuke Miyajima et al.   Applied Physics Express

Very low surface recombination velocity on p-type c-Si by high-rate plasma-deposited aluminum oxide

(2009) Pierre Saint-Cast et al.   APPLIED PHYSICS LETTERS

Atomic Layer Deposition: An Overview

(2009) Steven M. George   CHEMICAL REVIEWS

Effective surface passivation of crystalline silicon by rf sputtered aluminum oxide

(2009) Tsu-Tsung Li et al.   Physica Status Solidi-Rapid Research Letters

Silicon surface passivation by ultrathin Al2O3films synthesized by thermal and plasma atomic layer deposition

(2009) G. Dingemans et al.   Physica Status Solidi-Rapid Research Letters

An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD

(2008) Michael T. Seman et al.   CHEMICAL VAPOR DEPOSITION

Silicon surface passivation by atomic layer deposited Al2O3

(2008) B. Hoex et al.   JOURNAL OF APPLIED PHYSICS

On the c-Si surface passivation mechanism by the negative-charge-dielectric Al2O3

(2008) B. Hoex et al.   JOURNAL OF APPLIED PHYSICS

Properties of aluminum oxide thin films deposited by pulsed laser deposition and plasma enhanced chemical vapor deposition

(2007) C. Cibert et al.   THIN SOLID FILMS