Modeling alumina atomic layer deposition reaction kinetics during the trimethylaluminum exposure
Published 2013 View Full Article
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Title
Modeling alumina atomic layer deposition reaction kinetics during the trimethylaluminum exposure
Authors
Keywords
Atomic layer deposition, Alumina, Reaction kinetics modeling, Transition state theory, Statistical mechanics, Numerical simulation
Journal
THEORETICAL CHEMISTRY ACCOUNTS
Volume 133, Issue 1, Pages -
Publisher
Springer Nature
Online
2013-11-25
DOI
10.1007/s00214-013-1414-0
References
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