标题
Ferroelectric Hf0.5Zr0.5O2 Thin Films: A Review of Recent Advances
作者
关键词
-
出版物
JOM
Volume -, Issue -, Pages -
出版商
Springer Nature America, Inc
发表日期
2018-09-29
DOI
10.1007/s11837-018-3140-5
参考文献
相关参考文献
注意:仅列出部分参考文献,下载原文获取全部文献信息。- Ferroelectricity in Hf0.5Zr0.5O2 Thin Films: A Microscopic Study of the Polarization Switching Phenomenon and Field-Induced Phase Transformations
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- Microstructure research for ferroelectric origin in the strained Hf0.5Zr0.5O2 thin film via geometric phase analysis
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- HfZrOx-Based Ferroelectric Synapse Device With 32 Levels of Conductance States for Neuromorphic Applications
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- Self-Aligned, Gate Last, FDSOI, Ferroelectric Gate Memory Device With 5.5-nm Hf0.8Zr0.2O2, High Endurance and Breakdown Recovery
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- Modeling ferroelectric film properties and size effects from tetragonal interlayer in Hf1–xZrxO2 grains
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- Effect of the film thickness on the crystal structure and ferroelectric properties of (Hf 0.5 Zr 0.5 )O 2 thin films deposited on various substrates
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- Electron transport across ultrathin ferroelectric Hf 0.5 Zr 0.5 O 2 films on Si
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- Sustained Sub-60 mV/decade Switching via the Negative Capacitance Effect in MoS2 Transistors
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- Surface and grain boundary energy as the key enabler of ferroelectricity in nanoscale hafnia-zirconia: a comparison of model and experiment
- (2017) Min Hyuk Park et al. Nanoscale
- Very large phase shift of microwave signals in a 6 nm Hf x Zr1−x O2 ferroelectric at ±3 V
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- Preparation and characterization of ferroelectric Hf0.5Zr0.5O2 thin films grown by reactive sputtering
- (2017) Young Hwan Lee et al. NANOTECHNOLOGY
- Steep-slope hysteresis-free negative capacitance MoS2 transistors
- (2017) Mengwei Si et al. Nature Nanotechnology
- Low temperature plasma-enhanced ALD TiN ultrathin films for Hf0.5 Zr0.5 O2 -based ferroelectric MIM structures
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- A Ferroelectric Thin Film Transistor Based on Annealing-Free HfZrO Film
- (2017) Yuxing Li et al. IEEE Journal of the Electron Devices Society
- Fluorine-Free Oil Absorbents Made from Cellulose Nanofibril Aerogels
- (2016) Arie Mulyadi et al. ACS Applied Materials & Interfaces
- Effect of Zr Content on the Wake-Up Effect in Hf1–xZrxO2 Films
- (2016) Min Hyuk Park et al. ACS Applied Materials & Interfaces
- Induction of ferroelectricity in nanoscale ZrO 2 /HfO 2 bilayer thin films on Pt/Ti/SiO 2 /Si substrates
- (2016) Y.W. Lu et al. ACTA MATERIALIA
- Giant Negative Electrocaloric Effects of Hf0.5Zr0.5O2Thin Films
- (2016) Min Hyuk Park et al. ADVANCED MATERIALS
- Fully ALD-grown TiN/Hf0.5Zr0.5O2/TiN stacks: Ferroelectric and structural properties
- (2016) Sergei Zarubin et al. APPLIED PHYSICS LETTERS
- Impact of mechanical stress on ferroelectricity in (Hf0.5Zr0.5)O2 thin films
- (2016) Takahisa Shiraishi et al. APPLIED PHYSICS LETTERS
- Ferroelectricity and ferroelectric resistive switching in sputtered Hf0.5Zr0.5O2 thin films
- (2016) Zhen Fan et al. APPLIED PHYSICS LETTERS
- Two-step polarization switching mediated by a nonpolar intermediate phase in Hf0.4Zr0.6O2thin films
- (2016) Min Hyuk Park et al. Nanoscale
- A study on the wake-up effect of ferroelectric Hf0.5Zr0.5O2films by pulse-switching measurement
- (2016) Han Joon Kim et al. Nanoscale
- A thermally robust and thickness independent ferroelectric phase in laminated hafnium zirconium oxide
- (2016) S. Riedel et al. AIP Advances
- Ferroelectricity and Antiferroelectricity of Doped Thin HfO2-Based Films
- (2015) Min Hyuk Park et al. ADVANCED MATERIALS
- Contribution of oxygen vacancies to the ferroelectric behavior of Hf0.5Zr0.5O2 thin films
- (2015) Takao Shimizu et al. APPLIED PHYSICS LETTERS
- Study on the size effect in Hf0.5Zr0.5O2 films thinner than 8 nm before and after wake-up field cycling
- (2015) Min Hyuk Park et al. APPLIED PHYSICS LETTERS
- Charge transport mechanism in thin films of amorphous and ferroelectric Hf0.5Zr0.5O2
- (2015) D. R. Islamov et al. JETP LETTERS
- The origin of ferroelectricity in Hf1−xZrxO2: A computational investigation and a surface energy model
- (2015) R. Materlik et al. JOURNAL OF APPLIED PHYSICS
- Thickness-dependent phase evolution and dielectric property of Hf0.5Zr0.5O2 thin films prepared with aqueous precursor
- (2015) Yong Yan et al. JOURNAL OF SOL-GEL SCIENCE AND TECHNOLOGY
- Confinement-free annealing induced ferroelectricity in Hf0.5Zr0.5O2 thin films
- (2015) A. Chernikova et al. MICROELECTRONIC ENGINEERING
- Ferroelectric Hafnium Oxide Based Materials and Devices: Assessment of Current Status and Future Prospects
- (2015) J. Muller et al. ECS Journal of Solid State Science and Technology
- Study on the internal field and conduction mechanism of atomic layer deposited ferroelectric Hf0.5Zr0.5O2 thin films
- (2015) M. H. Park et al. Journal of Materials Chemistry C
- A highly efficient flexible dye-sensitized solar cell based on nickel sulfide/platinum/titanium counter electrode
- (2015) Gentian Yue et al. Nanoscale Research Letters
- Ferroelectricity of HfZrO2 in Energy Landscape With Surface Potential Gain for Low-Power Steep-Slope Transistors
- (2015) Min Hung Lee et al. IEEE Journal of the Electron Devices Society
- Study on the degradation mechanism of the ferroelectric properties of thin Hf0.5Zr0.5O2 films on TiN and Ir electrodes
- (2014) Min Hyuk Park et al. APPLIED PHYSICS LETTERS
- The effects of crystallographic orientation and strain of thin Hf0.5Zr0.5O2 film on its ferroelectricity
- (2014) Min Hyuk Park et al. APPLIED PHYSICS LETTERS
- Grain size engineering for ferroelectric Hf0.5Zr0.5O2 films by an insertion of Al2O3 interlayer
- (2014) Han Joon Kim et al. APPLIED PHYSICS LETTERS
- Study on the effect of heat treatment conditions on metalorganic-chemical-vapor-deposited ferroelectric Hf0.5Zr0.5O2thin film on Ir electrode
- (2014) Takao Shimizu et al. JAPANESE JOURNAL OF APPLIED PHYSICS
- Ferroelectric properties and switching endurance of Hf0.5Zr0.5O2films on TiN bottom and TiN or RuO2top electrodes
- (2014) Min Hyuk Park et al. Physica Status Solidi-Rapid Research Letters
- Effect of forming gas annealing on the ferroelectric properties of Hf0.5Zr0.5O2 thin films with and without Pt electrodes
- (2013) Min Hyuk Park et al. APPLIED PHYSICS LETTERS
- Evolution of phases and ferroelectric properties of thin Hf0.5Zr0.5O2 films according to the thickness and annealing temperature
- (2013) Min Hyuk Park et al. APPLIED PHYSICS LETTERS
- Ferroelectricity in Simple Binary ZrO2 and HfO2
- (2012) Johannes Müller et al. NANO LETTERS
- Ferroelectricity in hafnium oxide thin films
- (2011) T. S. Böscke et al. APPLIED PHYSICS LETTERS
- Ferroelectric Zr0.5Hf0.5O2thin films for nonvolatile memory applications
- (2011) J. Müller et al. APPLIED PHYSICS LETTERS
- The effect of dopants on the dielectric constant of HfO[sub 2] and ZrO[sub 2] from first principles
- (2008) Dominik Fischer et al. APPLIED PHYSICS LETTERS
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