Tiered deposition of sub-5 nm ferroelectric Hf1-xZrxO2 films on metal and semiconductor substrates
出版年份 2018 全文链接
标题
Tiered deposition of sub-5 nm ferroelectric Hf1-xZrxO2 films on metal and semiconductor substrates
作者
关键词
-
出版物
APPLIED PHYSICS LETTERS
Volume 112, Issue 19, Pages 192901
出版商
AIP Publishing
发表日期
2018-05-08
DOI
10.1063/1.5027516
参考文献
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