标题
Impact of mechanical stress on ferroelectricity in (Hf0.5Zr0.5)O2 thin films
作者
关键词
-
出版物
APPLIED PHYSICS LETTERS
Volume 108, Issue 26, Pages 262904
出版商
AIP Publishing
发表日期
2016-07-01
DOI
10.1063/1.4954942
参考文献
相关参考文献
注意:仅列出部分参考文献,下载原文获取全部文献信息。- Contribution of oxygen vacancies to the ferroelectric behavior of Hf0.5Zr0.5O2 thin films
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