标题
Effects of high pressure nitrogen annealing on ferroelectric Hf0.5Zr0.5O2 films
作者
关键词
-
出版物
APPLIED PHYSICS LETTERS
Volume 112, Issue 9, Pages 092906
出版商
AIP Publishing
发表日期
2018-03-02
DOI
10.1063/1.5003369
参考文献
相关参考文献
注意:仅列出部分参考文献,下载原文获取全部文献信息。- An extensive study of the influence of dopants on the ferroelectric properties of HfO2
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- The effects of crystallographic orientation and strain of thin Hf0.5Zr0.5O2 film on its ferroelectricity
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- Ferroelectric properties and switching endurance of Hf0.5Zr0.5O2films on TiN bottom and TiN or RuO2top electrodes
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- Evolution of phases and ferroelectric properties of thin Hf0.5Zr0.5O2 films according to the thickness and annealing temperature
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