Self-cleaning and surface chemical reactions during hafnium dioxide atomic layer deposition on indium arsenide
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Title
Self-cleaning and surface chemical reactions during hafnium dioxide atomic layer deposition on indium arsenide
Authors
Keywords
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Journal
Nature Communications
Volume 9, Issue 1, Pages -
Publisher
Springer Nature
Online
2018-04-11
DOI
10.1038/s41467-018-03855-z
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