In situ infrared spectroscopy study of the interface self-cleaning during the atomic layer deposition of HfO2 on GaAs(100) surfaces

Decomposition of Metal Alkylamides, Alkyls, and Halides at Reducible Oxide Surfaces: Mechanism of ‘Clean-up’ During Atomic Layer Deposition of Dielectrics onto III–V Substrates

(2014) Sylwia Klejna et al.   CHEMISTRY OF MATERIALS

Indium Diffusion and Native Oxide Removal during the Atomic Layer Deposition (ALD) of TiO2 Films on InAs(100) Surfaces

(2013) Liwang Ye et al.   ACS Applied Materials & Interfaces

In situ study of HfO2 atomic layer deposition on InP(100)

(2013) H. Dong et al.   APPLIED PHYSICS LETTERS

Interfacial oxide re-growth in thin film metal oxide III-V semiconductor systems

(2012) S. McDonnell et al.   APPLIED PHYSICS LETTERS

IR study of fundamental chemical reactions in atomic layer deposition of HfO2 with tetrakis(ethylmethylamino)hafnium (TEMAH), ozone, and water vapor

(2012) F. Hirose et al.   APPLIED SURFACE SCIENCE

Interface Between Atomic Layer Deposition Ta2O5 Films and GaAs(100) Surfaces

(2012) Theodosia Gougousi et al.   Journal of Physical Chemistry C

Tetrakis(ethylmethylamido) Hafnium Adsorption and Reaction on Hydrogen-Terminated Si(100) Surfaces

(2011) Kejing Li et al.   Journal of Physical Chemistry C

First-Principles Modeling of the “Clean-Up” of Native Oxides during Atomic Layer Deposition onto III–V Substrates

(2011) Sylwia Klejna et al.   Journal of Physical Chemistry C

Interfacial self cleaning during atomic layer deposition and annealing of HfO2 films on native (100)-GaAs substrates

(2010) Rahul Suri et al.   APPLIED PHYSICS LETTERS

Reflection absorption infrared spectroscopy during atomic layer deposition of HfO2 films from tetrakis(ethylmethylamido)hafnium and water

(2010) Brent A. Sperling et al.   APPLIED SURFACE SCIENCE

Tetrakis(dimethylamido)hafnium Adsorption and Reaction on Hydrogen Terminated Si(100) Surfaces

(2010) Kejing Li et al.   Journal of Physical Chemistry C

Growth and Interface Evolution of HfO[sub 2] Films on GaAs(100) Surfaces

(2010) Theodosia Gougousi et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Atomic Layer Deposition: An Overview

(2009) Steven M. George   CHEMICAL REVIEWS

Interface of atomic layer deposited HfO2 films on GaAs (100) surfaces

(2008) Justin C. Hackley et al.   APPLIED PHYSICS LETTERS

GaAs interfacial self-cleaning by atomic layer deposition

(2008) C. L. Hinkle et al.   APPLIED PHYSICS LETTERS

Carrier-Transport-Enhanced Channel CMOS for Improved Power Consumption and Performance

(2008) Shinichi Takagi et al.   IEEE TRANSACTIONS ON ELECTRON DEVICES