Effect of EDTA-modified alumina composite abrasive on the CMP performance of sapphire substrate

Surface planarization of zirconia ceramic achieved by polyacrylamide grafted nanodiamond composite abrasives through chemical mechanical polishing

(2022) Ruyue Ding et al.   CERAMICS INTERNATIONAL

Improvement in dispersion stability of alumina suspensions and corresponding chemical mechanical polishing performance

(2022) Wantang Wang et al.   APPLIED SURFACE SCIENCE

Mesoporous carbon-alumina composites, aluminas and carbons prepared via a facile ball milling-assisted strategy

(2022) Barbara Szczęśniak et al.   MICROPOROUS AND MESOPOROUS MATERIALS

Chemical mechanical polishing for sapphire wafers using a developed slurry

(2021) Zhenyu Zhang et al.   Journal of Manufacturing Processes

A novel slurry for chemical mechanical polishing of single crystal diamond

(2021) Longxing Liao et al.   APPLIED SURFACE SCIENCE

An Innovative Movement Mode of Friction and Wear Tester Worktable and Its Application in CMP

(2021) Zifeng Ni et al.   ECS Journal of Solid State Science and Technology

Electrostatic Self-Assembled Composite Abrasives for Chemical Mechanical Polishing of A-Plane Sapphire

(2021) Haiyang Yu et al.   ECS Journal of Solid State Science and Technology

Modification and functional properties of detonation nanodiamond

(2020) A. M. Grechikhina et al.   FULLERENES NANOTUBES AND CARBON NANOSTRUCTURES

Preparation of flower-shaped silica abrasives by double system template method and its effect on polishing performance of sapphire wafers

(2019) Lei Xu et al.   CERAMICS INTERNATIONAL

Redox agent enhanced chemical mechanical polishing of thin film diamond

(2018) Soumen Mandal et al.   CARBON

Post-cationic Modification of a Pyrimidine-Based Conjugated Microporous Polymer for Enhancing the Removal Performance of Anionic Dyes in Water

(2018) Yuchuan Liu et al.   CHEMISTRY-A EUROPEAN JOURNAL

Preparation of a novel catalyst (SoFe III ) and its catalytic performance towards the removal rate of sapphire substrate during CMP process

(2018) Li Xu et al.   TRIBOLOGY INTERNATIONAL

Highly efficient degradation of dimethyl phthalate from Cu(II) and dimethyl phthalate wastewater by EDTA enhanced ozonation: Performance, intermediates and mechanism

(2018) Ying Liu et al.   JOURNAL OF HAZARDOUS MATERIALS

Highly efficient removal of sapphire by composite nanoabrasive with novel inorganic polyelectrolyte as a binder

(2018) Tianxian Wang et al.   JOURNAL OF ALLOYS AND COMPOUNDS

Surface Modified Alumina Particles and Their Chemical Mechanical Polishing (CMP) Behavior on C-plane (0001) Sapphire Substrate

(2017) WANG Wei-Lei et al.   JOURNAL OF INORGANIC MATERIALS

CMP behavior of alumina/metatitanic acid core–shell abrasives on sapphire substrates

(2017) Xin Wang et al.   PRECISION ENGINEERING-JOURNAL OF THE INTERNATIONAL SOCIETIES FOR PRECISION ENGINEERING AND NANOTECHNOLOGY

Preparation of Ce-doped colloidal SiO2 composite abrasives and their chemical mechanical polishing behavior on sapphire substrates

(2016) Hong Lei et al.   MATERIALS CHEMISTRY AND PHYSICS

A study of chemical products formed on sapphire (0001) during chemical–mechanical polishing

(2015) Xiaolei Shi et al.   SURFACE & COATINGS TECHNOLOGY

Atomically smooth gallium nitride surface prepared by chemical-mechanical polishing with different abrasives

(2014) Chunli Zou et al.   PROCEEDINGS OF THE INSTITUTION OF MECHANICAL ENGINEERS PART J-JOURNAL OF ENGINEERING TRIBOLOGY

Effects of CMP slurry additives on the agglomeration of alumina nanoparticles 1: General aggregation rate behavior

(2013) Neil Brahma et al.   JOURNAL OF COLLOID AND INTERFACE SCIENCE

Preparation of porous alumina-g-polystyrene sulfonic acid abrasive and its chemical mechanical polishing behavior on hard disk substrate

(2013) Liqin Huang et al.   MICROELECTRONIC ENGINEERING

A study of material removal amount of sapphire wafer in application of chemical mechanical polishing with different polishing pads

(2012) Zone-Ching Lin et al.   Journal of Mechanical Science and Technology

Macroscopic and Microscopic Investigation on Chemical Mechanical Polishing of Sapphire Wafer

(2012) Hyunseop Lee et al.   JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY

Chemical mechanical polishing of hard disk substrate with α-alumina-g-polystyrene sulfonic acid composite abrasive

(2010) Hong Lei et al.   THIN SOLID FILMS

FT-IR/PAS of the EDTA adsorbed on alumina with the various surface areas

(2008) S. Pasieczna-Patkowska et al.   European Physical Journal-Special Topics