Improvement in dispersion stability of alumina suspensions and corresponding chemical mechanical polishing performance

Chemical mechanical polishing for sapphire wafers using a developed slurry

(2021) Zhenyu Zhang et al.   Journal of Manufacturing Processes

Tribological behavior of 6H–SiC wafers in different chemical mechanical polishing slurries

(2021) Qixiang Zhang et al.   WEAR

Improvement in chemical mechanical polishing of 4H-SiC wafer by activating persulfate through the synergistic effect of UV and TiO2

(2021) Wantang Wang et al.   JOURNAL OF MATERIALS PROCESSING TECHNOLOGY

Improved chemical mechanical polishing performance in 4H-SiC substrate by combining novel mixed abrasive slurry and photocatalytic effect

(2021) Wantang Wang et al.   APPLIED SURFACE SCIENCE

A novel slurry for chemical mechanical polishing of single crystal diamond

(2021) Longxing Liao et al.   APPLIED SURFACE SCIENCE

Rheophysical study of dispersed alumina suspensions

(2021) Florian Boutenel et al.   POWDER TECHNOLOGY

The Effect of Surface Polarity on the CMP Behavior of 6H-SiC Substrates

(2020) Guomei Chen et al.   RUSSIAN JOURNAL OF APPLIED CHEMISTRY

Surface modulation to enhance chemical mechanical polishing performance of sliced silicon carbide Si-face

(2020) Gaopan Chen et al.   APPLIED SURFACE SCIENCE

Complexes of fluorinated, silicone and hydrocarbon surfactants with carboxymethylcellulose and their influence on properties of the alumina suspension

(2019) Jakub Matusiak et al.   COLLOID AND POLYMER SCIENCE

Ultrahigh Recovery of Fracture Strength on Mismatched Fractured Amorphous Surfaces of Silicon Carbide

(2019) Junfeng Cui et al.   ACS Nano

Novel polystyrene/CeO2-TiO2 multicomponent core/shell abrasives for high-efficiency and high-quality photocatalytic-assisted chemical mechanical polishing of reaction-bonded silicon carbide

(2019) Bo Gao et al.   APPLIED SURFACE SCIENCE

Unprecedented Piezoresistance Coefficient in Strained Silicon Carbide

(2019) Junfeng Cui et al.   NANO LETTERS

Development of a novel chemical mechanical polishing slurry and its polishing mechanisms on a nickel alloy

(2019) Zhenyu Zhang et al.   APPLIED SURFACE SCIENCE

A novel approach of chemical mechanical polishing for a titanium alloy using an environment-friendly slurry

(2018) Zhenyu Zhang et al.   APPLIED SURFACE SCIENCE

Mechanism of Reduced Sintering Temperature of Al2O3–ZrO2 Nanocomposites Obtained by Microwave Hydrothermal Synthesis

(2018) Iwona Koltsov et al.   Materials

Synthesis of sodium polyacrylate copolymers as water-based dispersants for ultrafine grinding of praseodymium zirconium silicate

(2018) Guanghua Huang et al.   COLLOIDS AND SURFACES A-PHYSICOCHEMICAL AND ENGINEERING ASPECTS

Environment friendly chemical mechanical polishing of copper

(2018) Zhenyu Zhang et al.   APPLIED SURFACE SCIENCE

Highly efficient removal of sapphire by composite nanoabrasive with novel inorganic polyelectrolyte as a binder

(2018) Tianxian Wang et al.   JOURNAL OF ALLOYS AND COMPOUNDS

Review of Silicon Carbide Power Devices and Their Applications

(2017) Xu She et al.   IEEE TRANSACTIONS ON INDUSTRIAL ELECTRONICS

Synthesis and mechanism study of gelatin grafted acetone formaldehyde sulphonates as oil-well cement dispersant

(2017) Chengwen Wang et al.   RSC Advances

Hollow microspheres Mg-doped ZrO 2 nanoparticles: Green assisted synthesis and applications in photocatalysis and photoluminescence

(2016) L. Renuka et al.   JOURNAL OF ALLOYS AND COMPOUNDS

Performance of colloidal silica and ceria based slurries on CMP of Si-face 6H-SiC substrates

(2015) Guomei Chen et al.   APPLIED SURFACE SCIENCE

Role of ionic strength in chemical mechanical polishing of silicon carbide using silica slurries

(2014) Uma Rames Krishna Lagudu et al.   COLLOIDS AND SURFACES A-PHYSICOCHEMICAL AND ENGINEERING ASPECTS

Effects of CMP slurry additives on the agglomeration of alumina nanoparticles 1: General aggregation rate behavior

(2013) Neil Brahma et al.   JOURNAL OF COLLOID AND INTERFACE SCIENCE

Hydrogen Generation by Hydrolysis of an Al/Al2O3-Composite Powder After Heat Treatment

(2013) Xiani Huang et al.   Energy Technology

Ultraprecision CMP for sapphire, GaN, and SiC for advanced optoelectronics materials

(2012) Hideo Aida et al.   CURRENT APPLIED PHYSICS

Hamaker 2: A Toolkit for the Calculation of Particle Interactions and Suspension Stability and its Application to Mullite Synthesis by Colloidal Methods

(2011) Ulrich Aschauer et al.   JOURNAL OF DISPERSION SCIENCE AND TECHNOLOGY

Poly(acrylic acid) as a rheology modifier for dense alumina dispersions in high ionic strength environments

(2010) Prasad S. Bhosale et al.   COLLOIDS AND SURFACES A-PHYSICOCHEMICAL AND ENGINEERING ASPECTS

Efficiency of different dispersing devices for dispersing nanosized silica and alumina

(2010) Carsten Schilde et al.   POWDER TECHNOLOGY

Chemical effect on the material removal rate in the CMP of silicon wafers

(2010) Y.G. Wang et al.   WEAR

Preparation of α-alumina/polymethacrylic acid composite abrasive and its CMP performance on glass substrate

(2008) Zefang Zhang et al.   MICROELECTRONIC ENGINEERING