Preparation of Irregular Silica Nanoparticles by the Polymer Templating for Chemical Mechanical Polishing of Sapphire Substrates
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Title
Preparation of Irregular Silica Nanoparticles by the Polymer Templating for Chemical Mechanical Polishing of Sapphire Substrates
Authors
Keywords
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Journal
JOURNAL OF ELECTRONIC MATERIALS
Volume -, Issue -, Pages -
Publisher
Springer Science and Business Media LLC
Online
2019-05-04
DOI
10.1007/s11664-019-07248-w
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- (2012) E. A. Vovk et al. Journal of Surface Investigation-X-Ray Synchrotron and Neutron Techniques
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