Effect of low RF bias potential on AlN films obtained by Microwave Plasma Enhanced Chemical Vapor Deposition

标题
Effect of low RF bias potential on AlN films obtained by Microwave Plasma Enhanced Chemical Vapor Deposition
作者
关键词
-
出版物
SURFACE & COATINGS TECHNOLOGY
Volume 256, Issue -, Pages 3-8
出版商
Elsevier BV
发表日期
2013-11-05
DOI
10.1016/j.surfcoat.2013.10.067

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