期刊
ACTA MATERIALIA
卷 56, 期 17, 页码 4932-4943出版社
PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.actamat.2008.06.007
关键词
Low-permittivity; Organosilicate glass; Thin film; Mechanical properties; Fracture
资金
- Semiconductor Research Corporation [2005-KC-1292.011, 2005KJ-1339.001]
The structure and mechanical behavior of organosilicate glass (OSG) coatings have been analyzed as a function of composition and UV irradiation time. A decrease in the OSG carbon content results in more networking bonds and increased connectivity UV irradiation increases the connectivity by severing weak terminal bonds and stabilizes the network through local bond rearrangements. These structure modifications lead to a significant improvement in the stiffness, hardness, and fracture energy of these coatings. The networking bond density and mean connectivity number correlate well with the mechanical behavior of the OSG films, although network bond density weighted by bond energy is a more appropriate measure. The adhesion energy of silicon nitride to OSG is significantly higher than the cohesive energy of the OSG as a result of interface densification and crack-tip shielding. Subcritical fracture measurements in aqueous environments show that the detrimental effect of water on adhesion Surpasses the effect of network connectivity. (c) 2008 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.
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