Plasma-enhanced and thermal atomic layer deposition of Al2O3using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
出版年份 2012 全文链接
标题
Plasma-enhanced and thermal atomic layer deposition of Al2O3using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
作者
关键词
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出版物
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
Volume 30, Issue 2, Pages 021505
出版商
American Vacuum Society
发表日期
2012-02-18
DOI
10.1116/1.3683057
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