In SituStudies on Reaction Mechanisms in Atomic Layer Deposition

In Situ Reaction Mechanism Studies on the New tBuN=M(NEt2)3 -Water and tBuN=M(NEt2)3 - Ozone (M = Nb,Ta) Atomic Layer Deposition Processes

(2012) Yoann Tomczak et al.   CHEMISTRY OF MATERIALS

In situ synchrotron based x-ray fluorescence and scattering measurements during atomic layer deposition: Initial growth of HfO2 on Si and Ge substrates

(2011) K. Devloo-Casier et al.   APPLIED PHYSICS LETTERS

In situ Reaction Mechanism Studies on Atomic Layer Deposition of Ir and IrO2from Ir(acac)3

(2011) Kjell Knapas et al.   CHEMISTRY OF MATERIALS

Indium Oxide Atomic Layer Deposition Facilitated by the Synergy between Oxygen and Water

(2011) Joseph A. Libera et al.   CHEMISTRY OF MATERIALS

Surface Chemistry of Copper(I) Acetamidinates in Connection with Atomic Layer Deposition (ALD) Processes

(2011) Qiang Ma et al.   CHEMISTRY OF MATERIALS

Mechanism of Self-catalytic Atomic Layer Deposition of Silicon Dioxide Using 3-Aminopropyl Triethoxysilane, Water, and Ozone

(2011) Vikrant R. Rai et al.   CHEMISTRY OF MATERIALS

Tetrakis(ethylmethylamido) Hafnium Adsorption and Reaction on Hydrogen-Terminated Si(100) Surfaces

(2011) Kejing Li et al.   Journal of Physical Chemistry C

In Situ X-ray Fluorescence Measurements During Atomic Layer Deposition: Nucleation and Growth of TiO2 on Planar Substrates and in Nanoporous Films

(2011) Jolien Dendooven et al.   Journal of Physical Chemistry C

Atomic Layer Deposition of Fe2O3 Using Ferrocene and Ozone

(2011) Alex B. F. Martinson et al.   Journal of Physical Chemistry C

Spatial atomic layer deposition: A route towards further industrialization of atomic layer deposition

(2011) Paul Poodt et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

In Situ Reaction Mechanism Studies on Ozone-Based Atomic Layer Deposition of Al2O3 and HfO2

(2010) Martin Rose et al.   ACS Applied Materials & Interfaces

Reflection absorption infrared spectroscopy during atomic layer deposition of HfO2 films from tetrakis(ethylmethylamido)hafnium and water

(2010) Brent A. Sperling et al.   APPLIED SURFACE SCIENCE

In Situ Reaction Mechanism Studies on Atomic Layer Deposition of Sb2Te3and GeTe from (Et3Si)2Te and Chlorides

(2010) Kjell Knapas et al.   CHEMISTRY OF MATERIALS

Atomic Layer Deposition of Ir−Pt Alloy Films

(2010) Steven T. Christensen et al.   CHEMISTRY OF MATERIALS

Atomic Layer Deposition of Antimony and its Compounds Using Dechlorosilylation Reactions of Tris(triethylsilyl)antimony

(2010) Viljami Pore et al.   CHEMISTRY OF MATERIALS

Infrared and near-infrared spectroscopic probing of atomic layer deposition processes

(2010) A. O’Mahony et al.   JOURNAL OF MOLECULAR STRUCTURE

Tetrakis(dimethylamido)hafnium Adsorption and Reaction on Hydrogen Terminated Si(100) Surfaces

(2010) Kejing Li et al.   Journal of Physical Chemistry C

In2S3 Atomic Layer Deposition and Its Application as a Sensitizer on TiO2 Nanotube Arrays for Solar Energy Conversion

(2010) Shaibal K. Sarkar et al.   Journal of Physical Chemistry C

Genesis and Evolution of Surface Species during Pt Atomic Layer Deposition on Oxide Supports Characterized by in Situ XAFS Analysis and Water−Gas Shift Reaction

(2010) Worajit Setthapun et al.   Journal of Physical Chemistry C

Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide

(2010) Vikrant R. Rai et al.   LANGMUIR

Surface and Interface Processes during Atomic Layer Deposition of Copper on Silicon Oxide

(2010) Min Dai et al.   LANGMUIR

Mechanism, Products, and Growth Rate of Atomic Layer Deposition of Noble Metals

(2010) Simon D. Elliott   LANGMUIR

Enhancing the nucleation of palladium atomic layer deposition on Al2O3 using trimethylaluminum to prevent surface poisoning by reaction products

(2009) D. N. Goldstein et al.   APPLIED PHYSICS LETTERS

Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy

(2009) W. M. M. Kessels et al.   APPLIED PHYSICS LETTERS

Atomic Layer Deposition: An Overview

(2009) Steven M. George   CHEMICAL REVIEWS

Atomic Layer Deposition of Iridium Thin Films by Consecutive Oxidation and Reduction Steps

(2009) Jani Hämäläinen et al.   CHEMISTRY OF MATERIALS

Quartz Crystal Microbalance Studies of Al2O3Atomic Layer Deposition Using Trimethylaluminum and Water at 125 °C†

(2009) R. A. Wind et al.   JOURNAL OF PHYSICAL CHEMISTRY A

In Situ Infrared Characterization during Atomic Layer Deposition of Lanthanum Oxide

(2009) Jinhee Kwon et al.   Journal of Physical Chemistry C

Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide

(2009) Vikrant R. Rai et al.   Journal of Physical Chemistry C

Atomic Layer Deposition of Titanium Dioxide Thin Films from Cp*Ti(OMe)3 and Ozone

(2009) Martin Rose et al.   Journal of Physical Chemistry C

SiO2 Atomic Layer Deposition Using Tris(dimethylamino)silane and Hydrogen Peroxide Studied by in Situ Transmission FTIR Spectroscopy

(2009) B. B. Burton et al.   Journal of Physical Chemistry C

Atomic Layer Deposition of MgO Using Bis(ethylcyclopentadienyl)magnesium and H2O

(2009) B. B. Burton et al.   Journal of Physical Chemistry C

In situspectroscopic ellipsometry as a versatile tool for studying atomic layer deposition

(2009) E Langereis et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Atomic Layer Deposition of Metal Tellurides and Selenides Using Alkylsilyl Compounds of Tellurium and Selenium

(2009) Viljami Pore et al.   JOURNAL OF THE AMERICAN CHEMICAL SOCIETY

Reaction Mechanism Studies on Atomic Layer Deposition of Nb2O5from Nb(OEt)5and Water

(2009) Kjell Knapas et al.   LANGMUIR

Atomic layer deposition of Ge2Sb2Te5 thin films

(2009) Mikko Ritala et al.   MICROELECTRONIC ENGINEERING

Atomic layer deposition of MnO using Bis(ethylcyclopentadienyl)manganese and H2O

(2009) B.B. Burton et al.   THIN SOLID FILMS

Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy

(2008) E. Langereis et al.   APPLIED PHYSICS LETTERS

Detection of a Formate Surface Intermediate in the Atomic Layer Deposition of High-κ Dielectrics Using Ozone

(2008) Jinhee Kwon et al.   CHEMISTRY OF MATERIALS

In Situ Reaction Mechanism Studies on Atomic Layer Deposition of ZrO2from (CpMe)2Zr(OMe)Me and Water or Ozone

(2008) Kjell Knapas et al.   CHEMISTRY OF MATERIALS

Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3

(2008) S. B. S. Heil et al.   JOURNAL OF APPLIED PHYSICS

CO Gas Sensing by Ultrathin Tin Oxide Films Grown by Atomic Layer Deposition Using Transmission FTIR Spectroscopy†

(2008) X. Du et al.   JOURNAL OF PHYSICAL CHEMISTRY A

Surface Reaction Mechanisms during Ozone-Based Atomic Layer Deposition of Titanium Dioxide

(2008) Vikrant R. Rai et al.   Journal of Physical Chemistry C

Atomic Layer Deposition of Indium Tin Oxide Thin Films Using Nonhalogenated Precursors

(2008) Jeffrey W. Elam et al.   Journal of Physical Chemistry C

Al2O3 Atomic Layer Deposition with Trimethylaluminum and Ozone Studied by in Situ Transmission FTIR Spectroscopy and Quadrupole Mass Spectrometry

(2008) David N. Goldstein et al.   Journal of Physical Chemistry C

Tantalum Nitride Atomic Layer Deposition Using (tert-Butylimido)tris(diethylamido)tantalum and Hydrazine

(2008) B. B. Burton et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Atomic layer deposition of tin oxide films using tetrakis(dimethylamino) tin

(2008) Jeffrey W. Elam et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Mechanistic details of atomic layer deposition (ALD) processes for metal nitride film growth

(2007) Hugo Tiznado et al.   JOURNAL OF MOLECULAR CATALYSIS A-CHEMICAL