In situspectroscopic ellipsometry as a versatile tool for studying atomic layer deposition

Published 2009 View Full Article

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Title
In situspectroscopic ellipsometry as a versatile tool for studying atomic layer deposition
Authors
Keywords
-
Journal
JOURNAL OF PHYSICS D-APPLIED PHYSICS
Volume 42, Issue 7, Pages 073001
Publisher
IOP Publishing
Online
2009-03-14
DOI
10.1088/0022-3727/42/7/073001
References
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