Mechanism of Self-catalytic Atomic Layer Deposition of Silicon Dioxide Using 3-Aminopropyl Triethoxysilane, Water, and Ozone

Published 2011 View Full Article

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Title
Mechanism of Self-catalytic Atomic Layer Deposition of Silicon Dioxide Using 3-Aminopropyl Triethoxysilane, Water, and Ozone
Authors
Keywords
-
Journal
CHEMISTRY OF MATERIALS
Volume 23, Issue 9, Pages 2312-2316
Publisher
American Chemical Society (ACS)
Online
2011-04-16
DOI
10.1021/cm103052t

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