Review Article: Atomic layer deposition for oxide semiconductor thin film transistors: Advances in research and development

标题
Review Article: Atomic layer deposition for oxide semiconductor thin film transistors: Advances in research and development
作者
关键词
-
出版物
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
Volume 36, Issue 6, Pages 060801
出版商
American Vacuum Society
发表日期
2018-11-02
DOI
10.1116/1.5047237

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