Surface reaction kinetics in atomic layer deposition: An analytical model and experiments

Anomalously high alumina atomic layer deposition growth per cycle during trimethylaluminum under-dosing conditions

(2017) Hossein Salami et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Design of efficient mono-aminosilane precursors for atomic layer deposition of SiO2 thin films

(2017) Liang Huang et al.   RSC Advances

Toward Atomic-Scale Patterned Atomic Layer Deposition: Reactions of Al2O3 Precursors on a Si(001) Surface with Mixed Functionalizations

(2016) R. C. Longo et al.   Journal of Physical Chemistry C

Study of a Vanadium Precursor for VO2 Thin-Film Growth in the Atomic Layer Deposition Process by Multiscale Simulations

(2016) Hyunhang Park et al.   Journal of Physical Chemistry C

Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition

(2016) Triratna Muneshwar et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Atomic Layer Deposition of Gold Metal

(2015) Matthew B. E. Griffiths et al.   CHEMISTRY OF MATERIALS

Influence of atomic layer deposition valve temperature on ZrN plasma enhanced atomic layer deposition growth

(2015) Triratna Muneshwar et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma

(2015) Triratna Muneshwar et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Density Functional Theory Predictions of the Composition of Atomic Layer Deposition-Grown Ternary Oxides

(2013) Ciaran Murray et al.   ACS Applied Materials & Interfaces

Modeling alumina atomic layer deposition reaction kinetics during the trimethylaluminum exposure

(2013) Curtisha D. Travis et al.   THEORETICAL CHEMISTRY ACCOUNTS

Atomic-scale simulation of ALD chemistry

(2012) Simon D Elliott   SEMICONDUCTOR SCIENCE AND TECHNOLOGY

Impact of parasitic reactions on wafer-scale uniformity in water-based and ozone-based atomic layer deposition

(2011) Laurent Henn-Lecordier et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

ALD and Parasitic Growth Characteristics of the Tetrakisethylmethylamino Hafnium (TEMAH)/H[sub 2]O Process

(2010) L. Nyns et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Applications of atomic layer deposition to nanofabrication and emerging nanodevices

(2008) Hyungjun Kim et al.   THIN SOLID FILMS