Influence of deposition temperature of thermal ALD deposited Al2O3 films on silicon surface passivation
出版年份 2015 全文链接
标题
Influence of deposition temperature of thermal ALD deposited Al2O3 films on silicon surface passivation
作者
关键词
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出版物
AIP Advances
Volume 5, Issue 6, Pages 067113
出版商
AIP Publishing
发表日期
2015-06-06
DOI
10.1063/1.4922267
参考文献
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注意:仅列出部分参考文献,下载原文获取全部文献信息。- Effect of low thermal budget annealing on surface passivation of silicon by ALD based aluminum oxide films
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