Modeling ALD Surface Reaction and Process Dynamics using Absolute Reaction Rate Theory

A Ballistic Transport and Surface Reaction Model for Simulating Atomic Layer Deposition Processes in High-Aspect-Ratio Nanopores

(2011) Raymond A. Adomaitis   CHEMICAL VAPOR DEPOSITION

Simple model for atomic layer deposition precursor reaction and transport in a viscous-flow tubular reactor

(2011) Angel Yanguas-Gil et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Reaction mechanisms for atomic layer deposition of aluminum oxide on semiconductor substrates

(2011) Annelies Delabie et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Conformality of Plasma-Assisted ALD: Physical Processes and Modeling

(2010) H. C. M. Knoops et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Atomic Layer Deposition: An Overview

(2009) Steven M. George   CHEMICAL REVIEWS

Modeling the Conformality of Atomic Layer Deposition: The Effect of Sticking Probability

(2009) J. Dendooven et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Density functional theory and beyond—opportunities for quantum methods in materials modeling semiconductor technology

(2008) Sadasivan Shankar et al.   JOURNAL OF PHYSICS-CONDENSED MATTER