Modeling alumina atomic layer deposition reaction kinetics during the trimethylaluminum exposure

标题
Modeling alumina atomic layer deposition reaction kinetics during the trimethylaluminum exposure
作者
关键词
Atomic layer deposition, Alumina, Reaction kinetics modeling, Transition state theory, Statistical mechanics, Numerical simulation
出版物
THEORETICAL CHEMISTRY ACCOUNTS
Volume 133, Issue 1, Pages -
出版商
Springer Nature
发表日期
2013-11-25
DOI
10.1007/s00214-013-1414-0

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