Improvement in chemical mechanical polishing of 4H-SiC wafer by activating persulfate through the synergistic effect of UV and TiO2
Published 2021 View Full Article
- Home
- Publications
- Publication Search
- Publication Details
Title
Improvement in chemical mechanical polishing of 4H-SiC wafer by activating persulfate through the synergistic effect of UV and TiO2
Authors
Keywords
Silicon carbide (SiC), Chemical mechanical polishing (CMP), Sulfate radical-based advanced oxidation processes (SR-AOPs), Response surface method (RSM), Electrochemical
Journal
JOURNAL OF MATERIALS PROCESSING TECHNOLOGY
Volume 295, Issue -, Pages 117150
Publisher
Elsevier BV
Online
2021-03-25
DOI
10.1016/j.jmatprotec.2021.117150
References
Ask authors/readers for more resources
Related references
Note: Only part of the references are listed.- Photocatalytic Mechanisms for Peroxymonosulfate Activation through the Removal of Methylene Blue: A Case Study
- (2019) Jorge Rodríguez-Chueca et al. International Journal of Environmental Research and Public Health
- Polishing single-crystal silicon carbide with porous structure diamond and graphene-TiO2 slurries
- (2019) Ming Yi Tsai et al. INTERNATIONAL JOURNAL OF ADVANCED MANUFACTURING TECHNOLOGY
- The influences of technological parameters on the ultraviolet photocatalytic reaction rate and photocatalysis-assisted polishing effect for SiC
- (2019) Qiusheng Yan et al. JOURNAL OF CRYSTAL GROWTH
- The influence of concentration of hydroxyl radical on the chemical mechanical polishing of SiC wafer based on the Fenton reaction
- (2018) Jiabin Lu et al. PRECISION ENGINEERING-JOURNAL OF THE INTERNATIONAL SOCIETIES FOR PRECISION ENGINEERING AND NANOTECHNOLOGY
- α-Fe2O3 Nanodisk/Bacterial Cellulose Hybrid Membranes as High-Performance Sulfate-Radical-Based Visible Light Photocatalysts under Stirring/Flowing States
- (2018) Zhong-Shuai Zhu et al. ACS Applied Materials & Interfaces
- Polishing-pad-free electrochemical mechanical polishing of single-crystalline SiC surfaces using polyurethane–CeO2 core–shell particles
- (2017) Junji Murata et al. INTERNATIONAL JOURNAL OF MACHINE TOOLS & MANUFACTURE
- UV-TiO2 photocatalysis-assisted chemical mechanical polishing 4H-SiC wafer
- (2017) Zewei Yuan et al. MATERIALS AND MANUFACTURING PROCESSES
- Generation of sulfate radical through heterogeneous catalysis for organic contaminants removal: Current development, challenges and prospects
- (2016) Wen-Da Oh et al. APPLIED CATALYSIS B-ENVIRONMENTAL
- Heat-activated persulfate oxidation of atrazine: Implications for remediation of groundwater contaminated by herbicides
- (2015) Yuefei Ji et al. CHEMICAL ENGINEERING JOURNAL
- XPS, UV–vis spectroscopy and AFM studies on removal mechanisms of Si-face SiC wafer chemical mechanical polishing (CMP)
- (2014) Yan Zhou et al. APPLIED SURFACE SCIENCE
- Characterization of colloidal silica abrasives with different sizes and their chemical–mechanical polishing performance on 4H-SiC (0001)
- (2014) Xiaolei Shi et al. APPLIED SURFACE SCIENCE
- Degradation kinetics and mechanism of β-lactam antibiotics by the activation of H2O2 and Na2S2O8 under UV-254nm irradiation
- (2014) Xuexiang He et al. JOURNAL OF HAZARDOUS MATERIALS
- Electrochemical corrosion of silicon carbide ceramics in sodium hydroxide
- (2014) M. Herrmann et al. JOURNAL OF THE EUROPEAN CERAMIC SOCIETY
- Extended study of the atomic step-terrace structure on hexagonal SiC (0001) by chemical-mechanical planarization
- (2013) Xiaolei Shi et al. APPLIED SURFACE SCIENCE
- Electrolytic Manipulation of Persulfate Reactivity by Iron Electrodes for Trichloroethylene Degradation in Groundwater
- (2013) Songhu Yuan et al. ENVIRONMENTAL SCIENCE & TECHNOLOGY
- Comparative study of the photodegradation of bisphenol A by HO, SO4− and CO3−/HCO3 radicals in aqueous phase
- (2013) Manuel Sánchez-Polo et al. SCIENCE OF THE TOTAL ENVIRONMENT
- Anodic TiO2 Nanotube Arrays for Dye-Sensitized Solar Cells Characterized by Electrochemical Impedance Spectroscopy
- (2012) Hui Ping Wu et al. CERAMICS INTERNATIONAL
- Sulfate radical anion oxidation of diclofenac and sulfamethoxazole for water decontamination
- (2012) Moussa Mahdi Ahmed et al. CHEMICAL ENGINEERING JOURNAL
- Ultraprecision CMP for sapphire, GaN, and SiC for advanced optoelectronics materials
- (2012) Hideo Aida et al. CURRENT APPLIED PHYSICS
- Peroxymonosulfate–Co(II) oxidation system for the removal of the non-ionic surfactant Brij 35 from aqueous solution
- (2011) Michele Pagano et al. CHEMOSPHERE
- Electrochemical corrosion of liquid phase sintered silicon carbide ceramics
- (2011) U. Sydow et al. MATERIALS AND CORROSION-WERKSTOFFE UND KORROSION
- Removal of carbamazepine from urban wastewater by sulfate radical oxidation
- (2010) Roger Matta et al. Environmental Chemistry Letters
Find the ideal target journal for your manuscript
Explore over 38,000 international journals covering a vast array of academic fields.
SearchBecome a Peeref-certified reviewer
The Peeref Institute provides free reviewer training that teaches the core competencies of the academic peer review process.
Get Started