Performance of colloidal silica and ceria based slurries on CMP of Si-face 6H-SiC substrates

Published 2015 View Full Article

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Title
Performance of colloidal silica and ceria based slurries on CMP of Si-face 6H-SiC substrates
Authors
Keywords
Chemical mechanical polishing (CMP), Silicon carbide (SiC), Silica, Ceria
Journal
APPLIED SURFACE SCIENCE
Volume 359, Issue -, Pages 664-668
Publisher
Elsevier BV
Online
2015-10-27
DOI
10.1016/j.apsusc.2015.10.158

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