Hollow cathode plasma-assisted atomic layer deposition of crystalline AlN, GaN and AlxGa1−xN thin films at low temperatures
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Title
Hollow cathode plasma-assisted atomic layer deposition of crystalline AlN, GaN and AlxGa1−xN thin films at low temperatures
Authors
Keywords
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Journal
Journal of Materials Chemistry C
Volume 2, Issue 12, Pages 2123-2136
Publisher
Royal Society of Chemistry (RSC)
Online
2014-01-08
DOI
10.1039/c3tc32418d
References
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- (2016) C. Ozgit et al. ACTA PHYSICA POLONICA A
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- Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
- (2012) Wenwen Lei et al. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
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- NEXAFS and XPS study of GaN formation on ion-bombarded GaAs surfaces
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