Enhancement-mode AlGaN/GaN HEMTs with thin and high Al composition barrier layers using O2plasma implantation
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Title
Enhancement-mode AlGaN/GaN HEMTs with thin and high Al composition barrier layers using O2plasma implantation
Authors
Keywords
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Journal
PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE
Volume 212, Issue 5, Pages 1081-1085
Publisher
Wiley
Online
2014-10-20
DOI
10.1002/pssa.201431585
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Note: Only part of the references are listed.- Investigation of gate leakage mechanism in Al2O3/Al0.55Ga0.45N/GaN metal-oxide-semiconductor high-electron-mobility transistors
- (2014) Jie-Jie Zhu et al. APPLIED PHYSICS LETTERS
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- (2013) T. L. Duan et al. APPLIED PHYSICS LETTERS
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- (2013) Jae-Hoon Lee et al. IEEE ELECTRON DEVICE LETTERS
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- Enhancement-Mode LaLuO3–AlGaN/GaN Metal–Insulator–Semiconductor High-Electron-Mobility Transistors Using Fluorine Plasma Ion Implantation
- (2013) Shu Yang et al. JAPANESE JOURNAL OF APPLIED PHYSICS
- Normally-Off AlGaN/GaN High Electron Mobility Transistors with Thin and High Al Composition Barrier Layers
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- Normally off AlGaN/GaN high electron mobility transistors with p-InGaN cap layer
- (2013) Takashi Mizutani et al. JOURNAL OF APPLIED PHYSICS
- Quality of the Oxidation Interface of AlGaN in Enhancement-Mode AlGaN/GaN High-Electron Mobility Transistors
- (2012) Hsien-Chin Chiu et al. IEEE TRANSACTIONS ON ELECTRON DEVICES
- Recessed-Gate Enhancement-Mode AlGaN/GaN Heterostructure Field-Effect Transistors on Si with Record DC Performance
- (2011) Herwig Hahn et al. Applied Physics Express
- Characterization of enhancement-mode AlGaN/GaN high electron mobility transistor using N2O plasma oxidation technology
- (2011) Hsien-Chin Chiu et al. APPLIED PHYSICS LETTERS
- Growth and Characterization of p-InGaN/i-InGaN/n-GaN Double-Heterojunction Solar Cells on Patterned Sapphire Substrates
- (2011) Mu-Tao Chu et al. IEEE ELECTRON DEVICE LETTERS
- 210-GHz InAlN/GaN HEMTs With Dielectric-Free Passivation
- (2011) Ronghua Wang et al. IEEE ELECTRON DEVICE LETTERS
- Low Ohmic Contact Resistancem-Plane AlGaN/GaN Heterojunction Field-Effect Transistors with Enhancement-Mode Operations
- (2010) Tetsuya Fujiwara et al. Applied Physics Express
- Novel E-Mode GaN-on-Si MOSHEMT Using a Selective Thermal Oxidation
- (2010) F. Medjdoub et al. IEEE ELECTRON DEVICE LETTERS
- Low On-Resistance High-Breakdown Normally Off AlN/GaN/AlGaN DHFET on Si Substrate
- (2010) F. Medjdoub et al. IEEE ELECTRON DEVICE LETTERS
- Development of enhancement mode AlN/GaN high electron mobility transistors
- (2009) C. Y. Chang et al. APPLIED PHYSICS LETTERS
- AlGaN/GaN Recessed MIS-Gate HFET With High-Threshold-Voltage Normally-Off Operation for Power Electronics Applications
- (2008) Tohru Oka et al. IEEE ELECTRON DEVICE LETTERS
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