Atomic stick-slip behaviors and anisotropic deformations on a rough surface during GaN wafer polishing: a simulation study
出版年份 2021 全文链接
标题
Atomic stick-slip behaviors and anisotropic deformations on a rough surface during GaN wafer polishing: a simulation study
作者
关键词
Asperity system, Thin film, Stick-slip, Deformation, Diamond abrasive
出版物
THIN SOLID FILMS
Volume -, Issue -, Pages 138744
出版商
Elsevier BV
发表日期
2021-05-17
DOI
10.1016/j.tsf.2021.138744
参考文献
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- (2021) Jiaming Lin et al. APPLIED SURFACE SCIENCE
- Interface structure and deformation mechanisms of AlN/GaN multilayers
- (2020) Haitao Li et al. CERAMICS INTERNATIONAL
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- (2020) Van-Thuc Nguyen et al. CERAMICS INTERNATIONAL
- Deformation induced atomic-scale frictional characteristics of atomically thin two-dimensional materials
- (2020) Yitian Peng et al. CARBON
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- (2020) Van-Thuc Nguyen et al. JOURNAL OF ALLOYS AND COMPOUNDS
- Effect of abrasive size on nano abrasive machining for wurtzite GaN single crystal via molecular dynamics study
- (2020) Yongqiang Wang et al. MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING
- Multiscale study of the dynamic friction coefficient due to asperity plowing
- (2020) Jianqiao Hu et al. Friction
- Effects of surface texturing on nanotribological properties and subsurface damage of monocrystalline GaN subjected to scratching investigated using molecular dynamics simulation
- (2020) Jian Guo et al. APPLIED SURFACE SCIENCE
- Photoelectrochemical mechanical polishing method for n-type gallium nitride
- (2019) Zhigang Dong et al. CIRP ANNALS-MANUFACTURING TECHNOLOGY
- Effects of pressure and slurry on removal mechanism during the chemical mechanical polishing of quartz glass using ReaxFF MD
- (2019) Xiaoguang Guo et al. APPLIED SURFACE SCIENCE
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- (2019) Van-Thuc Nguyen et al. CERAMICS INTERNATIONAL
- Stick-slip behaviours of water lubrication polymer materials under low speed conditions
- (2017) Conglin Dong et al. TRIBOLOGY INTERNATIONAL
- Study of the minimum depth of material removal in nanoscale mechanical machining of single crystalline copper
- (2016) Pengzhe Zhu et al. COMPUTATIONAL MATERIALS SCIENCE
- Investigation on the surface characterization of Ga-faced GaN after chemical-mechanical polishing
- (2015) Hua Gong et al. APPLIED SURFACE SCIENCE
- Stick–slip behaviour on Au(111) with adsorption of copper and sulfate
- (2015) Nikolay Podgaynyy et al. Beilstein Journal of Nanotechnology
- Mechanism of GaN CMP Based on H2O2 Slurry Combined with UV Light
- (2015) J. Wang et al. ECS Journal of Solid State Science and Technology
- Review of using gallium nitride for ionizing radiation detection
- (2015) Jinghui Wang et al. Applied Physics Reviews
- Effect of Polishing Parameters on Chemical Mechanical Planarization of C-Plane (0001) Gallium Nitride Surface Using SiO2and Al2O3Abrasives
- (2014) Khushnuma Asghar et al. ECS Journal of Solid State Science and Technology
- Molecular dynamics simulation of self-rotation effects on ultra-precision polishing of single-crystal copper
- (2013) Yihan Yang et al. AIP Advances
- Material removal mechanism during porous silica cluster impact on crystal silicon substrate studied by molecular dynamics simulation
- (2012) Ruling Chen et al. APPLIED SURFACE SCIENCE
- A study on phase transformation of monocrystalline silicon due to ultra-precision polishing by molecular dynamics simulation
- (2012) Lin Zhang et al. AIP Advances
- Abrasive rolling effects on material removal and surface finish in chemical mechanical polishing analyzed by molecular dynamics simulation
- (2011) Lina Si et al. JOURNAL OF APPLIED PHYSICS
- Chemical Mechanical Polishing of Gallium Nitride with Colloidal Silica
- (2011) Hideo Aida et al. JOURNAL OF THE ELECTROCHEMICAL SOCIETY
- Modelling and simulation of structure surface generation using computer controlled ultra-precision polishing
- (2011) C.F. Cheung et al. PRECISION ENGINEERING-JOURNAL OF THE INTERNATIONAL SOCIETIES FOR PRECISION ENGINEERING AND NANOTECHNOLOGY
- Molecular dynamics investigations on polishing of a silicon wafer with a diamond abrasive
- (2010) Paras M. Agrawal et al. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING
- Development of a pad conditioning simulation module with a diamond dresser for CMP applications
- (2010) Hsiu-Ming Yeh et al. INTERNATIONAL JOURNAL OF ADVANCED MANUFACTURING TECHNOLOGY
- Monoatomic layer removal mechanism in chemical mechanical polishing process: A molecular dynamics study
- (2010) Lina Si et al. JOURNAL OF APPLIED PHYSICS
- Investigation of material removal mechanism of silicon wafer in the chemical mechanical polishing process using molecular dynamics simulation method
- (2009) Xuesong Han et al. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING
- Bulk ammonothermal GaN
- (2009) R. Dwiliński et al. JOURNAL OF CRYSTAL GROWTH
- Visualization and analysis of atomistic simulation data with OVITO–the Open Visualization Tool
- (2009) Alexander Stukowski MODELLING AND SIMULATION IN MATERIALS SCIENCE AND ENGINEERING
- Global analysis of GaN growth using a solution technique
- (2007) D. Kashiwagi et al. JOURNAL OF CRYSTAL GROWTH
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