Material removal and wear mechanism in abrasive polishing of SiO2/SiC using molecular dynamics

出版年份 2020 全文链接

标题

作者

关键词

Molecular dynamics, Silicon carbide, Silicon dioxide, Wear regime, Sliding, Rolling

出版物

Volume -, Issue -, Pages -

出版商

Elsevier BV

发表日期

2020-05-31

DOI

10.1016/j.ceramint.2020.05.263

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