Effects of pressure and slurry on removal mechanism during the chemical mechanical polishing of quartz glass using ReaxFF MD

标题
Effects of pressure and slurry on removal mechanism during the chemical mechanical polishing of quartz glass using ReaxFF MD
作者
关键词
-
出版物
APPLIED SURFACE SCIENCE
Volume -, Issue -, Pages 144610
出版商
Elsevier BV
发表日期
2019-11-24
DOI
10.1016/j.apsusc.2019.144610

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