Atomic stick-slip behaviors and anisotropic deformations on a rough surface during GaN wafer polishing: a simulation study

Deformation anisotropy of nano-scratching on C-plane of sapphire: A molecular dynamics study and experiment

(2021) Jiaming Lin et al.   APPLIED SURFACE SCIENCE

Interface structure and deformation mechanisms of AlN/GaN multilayers

(2020) Haitao Li et al.   CERAMICS INTERNATIONAL

Material removal and wear mechanism in abrasive polishing of SiO2/SiC using molecular dynamics

(2020) Van-Thuc Nguyen et al.   CERAMICS INTERNATIONAL

Deformation induced atomic-scale frictional characteristics of atomically thin two-dimensional materials

(2020) Yitian Peng et al.   CARBON

Abrasive mechanisms and interfacial mechanics of amorphous silicon carbide thin films in chemical-mechanical planarization

(2020) Van-Thuc Nguyen et al.   JOURNAL OF ALLOYS AND COMPOUNDS

Effect of abrasive size on nano abrasive machining for wurtzite GaN single crystal via molecular dynamics study

(2020) Yongqiang Wang et al.   MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING

Multiscale study of the dynamic friction coefficient due to asperity plowing

(2020) Jianqiao Hu et al.   Friction

Effects of surface texturing on nanotribological properties and subsurface damage of monocrystalline GaN subjected to scratching investigated using molecular dynamics simulation

(2020) Jian Guo et al.   APPLIED SURFACE SCIENCE

Photoelectrochemical mechanical polishing method for n-type gallium nitride

(2019) Zhigang Dong et al.   CIRP ANNALS-MANUFACTURING TECHNOLOGY

Effects of pressure and slurry on removal mechanism during the chemical mechanical polishing of quartz glass using ReaxFF MD

(2019) Xiaoguang Guo et al.   APPLIED SURFACE SCIENCE

Material removal and interactions between an abrasive and a SiC substrate: A molecular dynamics simulation study

(2019) Van-Thuc Nguyen et al.   CERAMICS INTERNATIONAL

Stick-slip behaviours of water lubrication polymer materials under low speed conditions

(2017) Conglin Dong et al.   TRIBOLOGY INTERNATIONAL

Study of the minimum depth of material removal in nanoscale mechanical machining of single crystalline copper

(2016) Pengzhe Zhu et al.   COMPUTATIONAL MATERIALS SCIENCE

Investigation on the surface characterization of Ga-faced GaN after chemical-mechanical polishing

(2015) Hua Gong et al.   APPLIED SURFACE SCIENCE

Stick–slip behaviour on Au(111) with adsorption of copper and sulfate

(2015) Nikolay Podgaynyy et al.   Beilstein Journal of Nanotechnology

Mechanism of GaN CMP Based on H2O2 Slurry Combined with UV Light

(2015) J. Wang et al.   ECS Journal of Solid State Science and Technology

Review of using gallium nitride for ionizing radiation detection

(2015) Jinghui Wang et al.   Applied Physics Reviews

Effect of Polishing Parameters on Chemical Mechanical Planarization of C-Plane (0001) Gallium Nitride Surface Using SiO2and Al2O3Abrasives

(2014) Khushnuma Asghar et al.   ECS Journal of Solid State Science and Technology

Molecular dynamics simulation of self-rotation effects on ultra-precision polishing of single-crystal copper

(2013) Yihan Yang et al.   AIP Advances

Material removal mechanism during porous silica cluster impact on crystal silicon substrate studied by molecular dynamics simulation

(2012) Ruling Chen et al.   APPLIED SURFACE SCIENCE

A study on phase transformation of monocrystalline silicon due to ultra-precision polishing by molecular dynamics simulation

(2012) Lin Zhang et al.   AIP Advances

Abrasive rolling effects on material removal and surface finish in chemical mechanical polishing analyzed by molecular dynamics simulation

(2011) Lina Si et al.   JOURNAL OF APPLIED PHYSICS

Chemical Mechanical Polishing of Gallium Nitride with Colloidal Silica

(2011) Hideo Aida et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Modelling and simulation of structure surface generation using computer controlled ultra-precision polishing

(2011) C.F. Cheung et al.   PRECISION ENGINEERING-JOURNAL OF THE INTERNATIONAL SOCIETIES FOR PRECISION ENGINEERING AND NANOTECHNOLOGY

Molecular dynamics investigations on polishing of a silicon wafer with a diamond abrasive

(2010) Paras M. Agrawal et al.   APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING

Development of a pad conditioning simulation module with a diamond dresser for CMP applications

(2010) Hsiu-Ming Yeh et al.   INTERNATIONAL JOURNAL OF ADVANCED MANUFACTURING TECHNOLOGY

Monoatomic layer removal mechanism in chemical mechanical polishing process: A molecular dynamics study

(2010) Lina Si et al.   JOURNAL OF APPLIED PHYSICS

Investigation of material removal mechanism of silicon wafer in the chemical mechanical polishing process using molecular dynamics simulation method

(2009) Xuesong Han et al.   APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING

Bulk ammonothermal GaN

(2009) R. Dwiliński et al.   JOURNAL OF CRYSTAL GROWTH

Visualization and analysis of atomistic simulation data with OVITO–the Open Visualization Tool

(2009) Alexander Stukowski   MODELLING AND SIMULATION IN MATERIALS SCIENCE AND ENGINEERING

Global analysis of GaN growth using a solution technique

(2007) D. Kashiwagi et al.   JOURNAL OF CRYSTAL GROWTH