Plasma etching: Yesterday, today, and tomorrow

Abrupt transitions in species number densities and plasma parameters in a CH3F/O2 inductively coupled plasma

(2013) Erdinc Karakas et al.   APPLIED PHYSICS LETTERS

High-fidelity readout and control of a nuclear spin qubit in silicon

(2013) Jarryd J. Pla et al.   NATURE

Reliable transport through a microfabricatedX-junction surface-electrode ion trap

(2013) Kenneth Wright et al.   NEW JOURNAL OF PHYSICS

Considerations for Ultimate CMOS Scaling

(2012) K. J. Kuhn   IEEE TRANSACTIONS ON ELECTRON DEVICES

Quadrupole mass spectrometry of reactive plasmas

(2012) J Benedikt et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Interactions of chlorine plasmas with silicon chloride-coated reactor walls during and after silicon etching

(2012) Rohit Khare et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Cl atom recombination on silicon oxy-chloride layers deposited on chamber walls in chlorine–oxygen plasmas

(2012) Rohit Khare et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Ion energy distributions, electron temperatures, and electron densities in Ar, Kr, and Xe pulsed discharges

(2012) Hyungjoo Shin et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Surprising importance of photo-assisted etching of silicon in chlorine-containing plasmas

(2012) Hyungjoo Shin et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Sub-10 nm Carbon Nanotube Transistor

(2012) Aaron D. Franklin et al.   NANO LETTERS

A single-atom transistor

(2012) Martin Fuechsle et al.   Nature Nanotechnology

Controlling trapping potentials and stray electric fields in a microfabricated ion trap through design and compensation

(2012) S Charles Doret et al.   NEW JOURNAL OF PHYSICS

Single Molecule Electronic Devices

(2011) Hyunwook Song et al.   ADVANCED MATERIALS

A crowd of quantum entanglements

(2011) Saswato Das   IEEE SPECTRUM

Particle-in-cell simulation of ion energy distributions on an electrode by applying tailored bias waveforms in the afterglow of a pulsed plasma

(2011) Paola Diomede et al.   JOURNAL OF APPLIED PHYSICS

Mechanism of plasma-induced damage to low-k SiOCH films during plasma ashing of organic resists

(2011) Keigo Takeda et al.   JOURNAL OF APPLIED PHYSICS

Critical review: Plasma-surface reactions and the spinning wall method

(2011) V. M. Donnelly et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Quantum information processing and metrology with trapped ions

(2011) D.J. Wineland et al.   LASER PHYSICS LETTERS

Control of ion energy distributions using a pulsed plasma with synchronous bias on a boundary electrode

(2011) Hyungjoo Shin et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

High energy electron fluxes in dc-augmented capacitively coupled plasmas. II. Effects on twisting in high aspect ratio etching of dielectrics

(2010) Mingmei Wang et al.   JOURNAL OF APPLIED PHYSICS

Graphene transistors

(2010) Frank Schwierz   Nature Nanotechnology

Colloquium: Quantum networks with trapped ions

(2010) L.-M. Duan et al.   REVIEWS OF MODERN PHYSICS

Diagnostics of ballistic electrons in a dc/rf hybrid capacitively coupled discharge

(2009) Lin Xu et al.   APPLIED PHYSICS LETTERS

Plasma impact on 193 nm photoresist linewidth roughness: Role of plasma vacuum ultraviolet light

(2009) E. Pargon et al.   APPLIED PHYSICS LETTERS

Inductively Coupled Pulsed Plasmas in the Presence of Synchronous Pulsed Substrate Bias for Robust, Reliable, and Fine Conductor Etching

(2009) S. Banna et al.   IEEE TRANSACTIONS ON PLASMA SCIENCE

Studies of chlorine-oxygen plasmas and evidence for heterogeneous formation of ClO and ClO2

(2009) Joydeep Guha et al.   JOURNAL OF APPLIED PHYSICS

Effect of Cu contamination on recombination of O atoms on a plasma-oxidized silicon surface

(2009) Joydeep Guha et al.   JOURNAL OF APPLIED PHYSICS

Molecular dynamics for low temperature plasma–surface interaction studies

(2009) David B Graves et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Auger electron spectroscopy study of reactor walls in transition from an O2 to a Cl2 plasma

(2009) Joydeep Guha et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Synergistic effects of vacuum ultraviolet radiation, ion bombardment, and heating in 193nm photoresist roughening and degradation

(2008) D. Nest et al.   APPLIED PHYSICS LETTERS

Low-Dielectric-Constant Nonporous Fluorocarbon Films for Interlayer Dielectric

(2008) Azumi Itoh et al.   JAPANESE JOURNAL OF APPLIED PHYSICS

Mass and Auger electron spectroscopy studies of the interactions of atomic and molecular chlorine on a plasma reactor wall

(2008) Joydeep Guha et al.   JOURNAL OF APPLIED PHYSICS

Real-time plasma control in a dual-frequency, confined plasma etcher

(2008) V. Milosavljević et al.   JOURNAL OF APPLIED PHYSICS

In-Situ Surface Recombination Measurements of Oxygen Atoms on Anodized Aluminum in an Oxygen Plasma

(2008) Joydeep Guha et al.   Journal of Physical Chemistry C

Fast (tens to hundreds of eV) neutral beams for materials processing

(2008) Demetre J Economou   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Cross-Linked Organic Sacrificial Material for Air Gap Formation by Initiated Chemical Vapor Deposition

(2008) Long Hua Lee et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Overview of dual damascene integration schemes in Cu BEOL integration

(2008) J. Kriz et al.   MICROELECTRONIC ENGINEERING

High resolution, high sensitivity inorganic resists

(2008) Jason Stowers et al.   MICROELECTRONIC ENGINEERING

Quantum computing with trapped ions

(2008) H HAFFNER et al.   PHYSICS REPORTS-REVIEW SECTION OF PHYSICS LETTERS

Secondary electrons in rf and dc/rf capacitive discharges

(2008) E Kawamura et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY