Cl atom recombination on silicon oxy-chloride layers deposited on chamber walls in chlorine–oxygen plasmas

Interactions of chlorine plasmas with silicon chloride-coated reactor walls during and after silicon etching

(2012) Rohit Khare et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Critical review: Plasma-surface reactions and the spinning wall method

(2011) V. M. Donnelly et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Effect of Cu contamination on recombination of O atoms on a plasma-oxidized silicon surface

(2009) Joydeep Guha et al.   JOURNAL OF APPLIED PHYSICS

Recombination of chlorine atoms on plasma-conditioned stainless steel surfaces in the presence of adsorbed Cl2

(2009) Luc Stafford et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Effect of O2Gas during Inductively Coupled O2/Cl2Plasma Etching of Mo and HfO2for Gate Stack Patterning

(2008) Ho Young Jung et al.   JAPANESE JOURNAL OF APPLIED PHYSICS

Mass and Auger electron spectroscopy studies of the interactions of atomic and molecular chlorine on a plasma reactor wall

(2008) Joydeep Guha et al.   JOURNAL OF APPLIED PHYSICS

In-Situ Surface Recombination Measurements of Oxygen Atoms on Anodized Aluminum in an Oxygen Plasma

(2008) Joydeep Guha et al.   Journal of Physical Chemistry C