Real-time plasma control in a dual-frequency, confined plasma etcher

标题
Real-time plasma control in a dual-frequency, confined plasma etcher
作者
关键词
-
出版物
JOURNAL OF APPLIED PHYSICS
Volume 103, Issue 8, Pages 083302
出版商
AIP Publishing
发表日期
2008-04-23
DOI
10.1063/1.2903137

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