Surprising importance of photo-assisted etching of silicon in chlorine-containing plasmas

标题
Surprising importance of photo-assisted etching of silicon in chlorine-containing plasmas
作者
关键词
-
出版物
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
Volume 30, Issue 2, Pages 021306
出版商
American Vacuum Society
发表日期
2012-02-07
DOI
10.1116/1.3681285

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