Plasma impact on 193 nm photoresist linewidth roughness: Role of plasma vacuum ultraviolet light

标题
Plasma impact on 193 nm photoresist linewidth roughness: Role of plasma vacuum ultraviolet light
作者
关键词
-
出版物
APPLIED PHYSICS LETTERS
Volume 94, Issue 10, Pages 103111
出版商
AIP Publishing
发表日期
2009-03-13
DOI
10.1063/1.3094128

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