High energy electron fluxes in dc-augmented capacitively coupled plasmas. II. Effects on twisting in high aspect ratio etching of dielectrics

High energy electron fluxes in dc-augmented capacitively coupled plasmas I. Fundamental characteristics

(2010) Mingmei Wang et al.   JOURNAL OF APPLIED PHYSICS

Diagnostics of ballistic electrons in a dc/rf hybrid capacitively coupled discharge

(2009) Lin Xu et al.   APPLIED PHYSICS LETTERS

Hybrid modelling of low temperature plasmas for fundamental investigations and equipment design

(2009) Mark J Kushner   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Fast (tens to hundreds of eV) neutral beams for materials processing

(2008) Demetre J Economou   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Test particle simulation of the role of ballistic electrons in hybrid dc/rf capacitively coupled plasmas in argon

(2008) K. Denpoh et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Ion orbits in plasma etching of semiconductors

(2008) Tsitsi G. Madziwa-Nussinov et al.   PHYSICS OF PLASMAS

Secondary electrons in rf and dc/rf capacitive discharges

(2008) E Kawamura et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

In situ measurement of plasma charging on SiO2 hole bottoms and reduction by negative charge injection during etching

(2007) T. Ohmori et al.   APPLIED SURFACE SCIENCE