On the pressure effect in energetic deposition of Cu thin films by modulated pulsed power magnetron sputtering: A global plasma model and experiments

Origin of the energetic ions at the substrate generated during high power pulsed magnetron sputtering of titanium

(2014) C Maszl et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

On the road to self-sputtering in high power impulse magnetron sputtering: particle balance and discharge characteristics

(2014) Chunqing Huo et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

Three-dimensional thickness and property distribution of TiC films deposited by DC magnetron sputtering and HIPIMS

(2014) Martin Balzer et al.   SURFACE & COATINGS TECHNOLOGY

On sheath energization and Ohmic heating in sputtering magnetrons

(2013) Chunqing Huo et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

Space charge, plasma potential and electric field distributions in HiPIMS discharges of varying configuration

(2013) B Liebig et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

Comparison of the structural properties and residual stress of AlN films deposited by dc magnetron sputtering and high power impulse magnetron sputtering at different working pressures

(2013) K. Ait Aissa et al.   THIN SOLID FILMS

Plasma potential mapping of high power impulse magnetron sputtering discharges

(2012) Albert Rauch et al.   JOURNAL OF APPLIED PHYSICS

High power impulse magnetron sputtering discharge

(2012) J. T. Gudmundsson et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Understanding deposition rate loss in high power impulse magnetron sputtering: I. Ionization-driven electric fields

(2012) N Brenning et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

Gas rarefaction and the time evolution of long high-power impulse magnetron sputtering pulses

(2012) Chunqing Huo et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

Pressure effects on HiPIMS deposition of hafnium films

(2012) A.N. Reed et al.   SURFACE & COATINGS TECHNOLOGY

Pulse management in high power pulsed magnetron sputtering of niobium

(2012) M. Hála et al.   SURFACE & COATINGS TECHNOLOGY

Structure and properties of CrSiN nanocomposite coatings deposited by hybrid modulated pulsed power and pulsed dc magnetron sputtering

(2012) Jianliang Lin et al.   SURFACE & COATINGS TECHNOLOGY

The β to α phase transition of tantalum coatings deposited by modulated pulsed power magnetron sputtering

(2012) Sterling Myers et al.   SURFACE & COATINGS TECHNOLOGY

Magnetron sputter deposition as visualized by Monte Carlo modeling

(2012) D. Depla et al.   THIN SOLID FILMS

Low Friction CrNMPP/TiNDCMS Multilayer Coatings

(2012) J. Paulitsch et al.   TRIBOLOGY LETTERS

Effects of Ar gas pressure on microstructure of DLC films deposited by high-power pulsed magnetron sputtering

(2012) Setsuo Nakao et al.   VACUUM

Study of plasma dynamics in a modulated pulsed power magnetron discharge using a time-resolved Langmuir probe

(2011) L. Meng et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

An ionization region model for high-power impulse magnetron sputtering discharges

(2011) M A Raadu et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

Time-resolved plasma characterisation of modulated pulsed power magnetron sputtering of chromium

(2011) B. Liebig et al.   SURFACE & COATINGS TECHNOLOGY

Discharge physics of high power impulse magnetron sputtering

(2011) André Anders   SURFACE & COATINGS TECHNOLOGY

Thick CrN/AlN superlattice coatings deposited by the hybrid modulated pulsed power and pulsed dc magnetron sputtering

(2011) Jianliang Lin et al.   SURFACE & COATINGS TECHNOLOGY

Deposition rate characteristics for steady state high power impulse magnetron sputtering (HIPIMS) discharges generated with a modulated pulsed power (MPP) generator

(2011) F. Papa et al.   THIN SOLID FILMS

Effect of Negative Substrate Bias on the Structure and Properties of Ta Coatings Deposited Using Modulated Pulse Power Magnetron Sputtering

(2010) Jianliang Lin et al.   IEEE TRANSACTIONS ON PLASMA SCIENCE

Deposition rates of high power impulse magnetron sputtering: Physics and economics

(2010) André Anders   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

SRIM – The stopping and range of ions in matter (2010)

(2010) James F. Ziegler et al.   NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS

A phenomenological equilibrium model applicable to high-power pulsed magnetron sputtering

(2010) J Vlček et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

The evolution of the plasma potential in a HiPIMS discharge and its relationship to deposition rate

(2010) Anurag Mishra et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

On the film density using high power impulse magnetron sputtering

(2010) Mattias Samuelsson et al.   SURFACE & COATINGS TECHNOLOGY

High rate deposition of thick CrN and Cr2N coatings using modulated pulse power (MPP) magnetron sputtering

(2010) Jianliang Lin et al.   SURFACE & COATINGS TECHNOLOGY

Evolution of the plasma composition of a high power impulse magnetron sputtering system studied with a time-of-flight spectrometer

(2009) Efim Oks et al.   JOURNAL OF APPLIED PHYSICS

On the electron energy in the high power impulse magnetron sputtering discharge

(2009) J. T. Gudmundsson et al.   JOURNAL OF APPLIED PHYSICS

Computer modelling of magnetron discharges

(2009) Annemie Bogaerts et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Measurements of Deposition Rate and Substrate Heating in a HiPIMS Discharge

(2009) Glen West et al.   Plasma Processes and Polymers

Ion energy and mass distributions of the plasma during modulated pulse power magnetron sputtering

(2009) J. Lin et al.   SURFACE & COATINGS TECHNOLOGY

A structure zone diagram including plasma-based deposition and ion etching

(2009) André Anders   THIN SOLID FILMS

Mechanical properties and oxidation behaviour of (Al,Cr)N and (Al,Cr,Si)N coatings for cutting tools deposited by HPPMS

(2008) K. Bobzin et al.   THIN SOLID FILMS

Study on the orientation of silver films by ion-beam assisted deposition

(2007) Tao Feng et al.   APPLIED SURFACE SCIENCE