Understanding deposition rate loss in high power impulse magnetron sputtering: I. Ionization-driven electric fields

Title
Understanding deposition rate loss in high power impulse magnetron sputtering: I. Ionization-driven electric fields
Authors
Keywords
-
Journal
PLASMA SOURCES SCIENCE & TECHNOLOGY
Volume 21, Issue 2, Pages 025005
Publisher
IOP Publishing
Online
2012-03-09
DOI
10.1088/0963-0252/21/2/025005

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