Comparison of the structural properties and residual stress of AlN films deposited by dc magnetron sputtering and high power impulse magnetron sputtering at different working pressures

Published 2013 View Full Article

Authors

Keywords

Journal

THIN SOLID FILMS

Volume 550, Issue -, Pages 264-267

Publisher

Elsevier BV

Online

2013-11-22

DOI

10.1016/j.tsf.2013.11.073

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THIN SOLID FILMS

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