Optimizing process conditions for improved Hf 1−x Zr x O 2 ferroelectric capacitor performance

Title
Optimizing process conditions for improved Hf 1−x Zr x O 2 ferroelectric capacitor performance
Authors
Keywords
Ferroelectrics, Hafnium oxide, ALD process
Journal
MICROELECTRONIC ENGINEERING
Volume 178, Issue -, Pages 48-51
Publisher
Elsevier BV
Online
2017-05-03
DOI
10.1016/j.mee.2017.04.031

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