Ten-Nanometer Ferroelectric $\hbox{Si:HfO}_{2}$ Films for Next-Generation FRAM Capacitors

Authors

Keywords

Journal

Volume 33, Issue 9, Pages 1300-1302

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Online

2012-07-25

DOI

10.1109/led.2012.2204856

References

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