Effect of Annealing Ferroelectric HfO2 Thin Films: In Situ, High Temperature X-Ray Diffraction

标题
Effect of Annealing Ferroelectric HfO2 Thin Films: In Situ, High Temperature X-Ray Diffraction
作者
关键词
-
出版物
Advanced Electronic Materials
Volume 4, Issue 7, Pages 1800091
出版商
Wiley
发表日期
2018-05-17
DOI
10.1002/aelm.201800091

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