Cyclic azasilanes as volatile and reactive precursors for atomic layer deposition of silicon dioxide

Determination of the Analytical Relationship between Refractive Index and Density of SiO2Layers

(2016) W. Rzodkiewicz et al.   ACTA PHYSICA POLONICA A

Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 ( 2¯01)

(2015) Ye Jia et al.   APPLIED PHYSICS LETTERS

Self-catalysis by aminosilanes and strong surface oxidation by O2 plasma in plasma-enhanced atomic layer deposition of high-quality SiO2

(2015) Guo-Yong Fang et al.   CHEMICAL COMMUNICATIONS

Designing high performance precursors for atomic layer deposition of silicon oxide

(2015) Anupama Mallikarjunan et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Effect of Reaction Mechanism on Precursor Exposure Time in Atomic Layer Deposition of Silicon Oxide and Silicon Nitride

(2014) Ciaran A. Murray et al.   ACS Applied Materials & Interfaces

Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors

(2014) Matti Putkonen et al.   THIN SOLID FILMS

Highly Stable Ultrathin Carbosiloxane Films by Molecular Layer Deposition

(2013) Han Zhou et al.   Journal of Physical Chemistry C

Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties

(2012) G. Dingemans et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Mechanism of Self-catalytic Atomic Layer Deposition of Silicon Dioxide Using 3-Aminopropyl Triethoxysilane, Water, and Ozone

(2011) Vikrant R. Rai et al.   CHEMISTRY OF MATERIALS

Growth and electrical properties of silicon oxide grown by atomic layer deposition using Bis(ethyl-methyl-amino)silane and ozone

(2011) Seok-Jun Won et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Importance of Trimethylaluminum Diffusion in Three-Step ABC Molecular Layer Deposition Using Trimethylaluminum, Ethanolamine, and Maleic Anhydride

(2010) Dragos Seghete et al.   LANGMUIR

Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide

(2010) Vikrant R. Rai et al.   LANGMUIR

Surface Chemistry for Molecular Layer Deposition of Organic and Hybrid Organic−Inorganic Polymers

(2009) Steven M. George et al.   ACCOUNTS OF CHEMICAL RESEARCH

Oxide Electronics by Spatial Atomic Layer Deposition

(2009) David H. Levy et al.   Journal of Display Technology

SiO2 Atomic Layer Deposition Using Tris(dimethylamino)silane and Hydrogen Peroxide Studied by in Situ Transmission FTIR Spectroscopy

(2009) B. B. Burton et al.   Journal of Physical Chemistry C

A Practical, Self-Catalytic, Atomic Layer Deposition of Silicon Dioxide

(2008) Julien Bachmann et al.   ANGEWANDTE CHEMIE-INTERNATIONAL EDITION

Al2O3 Atomic Layer Deposition with Trimethylaluminum and Ozone Studied by in Situ Transmission FTIR Spectroscopy and Quadrupole Mass Spectrometry

(2008) David N. Goldstein et al.   Journal of Physical Chemistry C