Effect on passivation mechanism and properties of HfO2/crystalline-Si interface under different annealing atmosphere
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Title
Effect on passivation mechanism and properties of HfO2/crystalline-Si interface under different annealing atmosphere
Authors
Keywords
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Journal
SOLAR ENERGY MATERIALS AND SOLAR CELLS
Volume 257, Issue -, Pages 112384
Publisher
Elsevier BV
Online
2023-05-19
DOI
10.1016/j.solmat.2023.112384
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- (2020) Zeyang Ren et al. DIAMOND AND RELATED MATERIALS
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- (2019) Rajesh Kumar Jha et al. JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY
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- (2018) Evan Oudot et al. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
- Investigation of HfO2 Thin Films on Si by X-ray Photoelectron Spectroscopy, Rutherford Backscattering, Grazing Incidence X-ray Diffraction and Variable Angle Spectroscopic Ellipsometry
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- Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
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- (2011) G. Dingemans et al. JOURNAL OF APPLIED PHYSICS
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