Passivation properties of HfO2-SiO2 mixed metal oxide thin films with low reflectivity on silicon substrates for semiconductor devices
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Title
Passivation properties of HfO2-SiO2 mixed metal oxide thin films with low reflectivity on silicon substrates for semiconductor devices
Authors
Keywords
Passivation, Hafnium dioxide, Silicon dioxide, Silicon solar cells, Anti-reflection, Mixed metal oxide, Spin coating
Journal
THIN SOLID FILMS
Volume 738, Issue -, Pages 138965
Publisher
Elsevier BV
Online
2021-10-22
DOI
10.1016/j.tsf.2021.138965
References
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