Temperature-Dependent HfO2/Si Interface Structural Evolution and its Mechanism

Characterization of interface states in AlGaN/GaN metal-oxide-semiconductor heterostructure field-effect transistors with HfO 2 gate dielectric grown by atomic layer deposition

(2018) R. Stoklas et al.   APPLIED SURFACE SCIENCE

Growth properties and optical properties for HfO 2 thin films deposited by atomic layer deposition

(2018) Yaowei Wei et al.   JOURNAL OF ALLOYS AND COMPOUNDS

Hydrogen passivation of silicon/silicon oxide interface by atomic layer deposited hafnium oxide and impact of silicon oxide underlayer

(2018) Evan Oudot et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Advanced protective coatings for reflectivity enhancement by low temperature atomic layer deposition of HfO2 on Al surfaces for micromirror applications

(2018) E. Cianci et al.   SENSORS AND ACTUATORS A-PHYSICAL

Enhanced field effect passivation of c-Si surface via introduction of trap centers: Case of hafnium and aluminium oxide bilayer films deposited by thermal ALD

(2018) Jagannath Panigrahi et al.   SOLAR ENERGY MATERIALS AND SOLAR CELLS

Low temperature preparation of HfO2/SiO2 stack structure for interface dipole modulation

(2018) Noriyuki Miyata   APPLIED PHYSICS LETTERS

Effective surface passivation of In 0.53 Ga 0.47 As(0 0 1) using molecular beam epitaxy and atomic layer deposited HfO 2 – A comparative study

(2017) M. Hong et al.   JOURNAL OF CRYSTAL GROWTH

FT IR spectroscopy of nitric acid oxidation of silicon with hafnium oxide very thin layer

(2014) M. Kopani et al.   APPLIED SURFACE SCIENCE

Structure and optical properties of nanocrystalline hafnium oxide thin films

(2014) M. Vargas et al.   OPTICAL MATERIALS

Electron beam induced local crystallization of HfO2 nanopores for biosensing applications

(2013) Jiwook Shim et al.   Nanoscale

Electrical characterization of atomic-layer-deposited hafnium oxide films from hafnium tetrakis(dimethylamide) and water/ozone: Effects of growth temperature, oxygen source, and postdeposition annealing

(2012) Hector García et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Structure and dielectric properties of amorphous high-κoxides: HfO2, ZrO2, and their alloys

(2012) Yin Wang et al.   PHYSICAL REVIEW B

Interface analysis of HfO2films on (1 0 0)Si using x-ray photoelectron spectroscopy

(2009) A A Sokolov et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Compositional, structural and electronic characteristics of HfO2 and HfSiO dielectrics prepared by radio frequency magnetron sputtering

(2008) Li-ping Feng et al.   VACUUM

Silicon Orientation Effects in the Atomic Layer Deposition of Hafnium Oxide

(2007) L. Nyns et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY