Reliability assessment of ultra-thin HfO2 films deposited on silicon wafer

Published 2012 View Full Article

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Title
Reliability assessment of ultra-thin HfO2 films deposited on silicon wafer
Authors
Keywords
-
Journal
APPLIED SURFACE SCIENCE
Volume 258, Issue 22, Pages 8974-8979
Publisher
Elsevier BV
Online
2012-06-01
DOI
10.1016/j.apsusc.2012.05.131

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