Silicon Passivation by Ultrathin Hafnium Oxide Layer for Photoelectrochemical Applications
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Title
Silicon Passivation by Ultrathin Hafnium Oxide Layer for Photoelectrochemical Applications
Authors
Keywords
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Journal
Frontiers in Chemistry
Volume 10, Issue -, Pages -
Publisher
Frontiers Media SA
Online
2022-03-30
DOI
10.3389/fchem.2022.859023
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