Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System

An improvement of HfO2/Ge interface byin situremote N2plasma pretreatment for Ge MOS devices

(2016) Xiaowei Chi et al.   Materials Research Express

Silicon surface passivation using thin HfO 2 films by atomic layer deposition

(2015) Jhuma Gope et al.   APPLIED SURFACE SCIENCE

Advanced passivation techniques for Si solar cells with high-κ dielectric materials

(2014) Huijuan Geng et al.   APPLIED PHYSICS LETTERS

Symmetrical Al2O3-based passivation layers for p- and n-type silicon

(2014) Daniel K. Simon et al.   SOLAR ENERGY MATERIALS AND SOLAR CELLS

Characterization of Al2O3 surface passivation of silicon solar cells

(2014) Abdulrahman M. Albadri   THIN SOLID FILMS

Advances in surface passivation and emitter optimization techniques of c-Si solar cells

(2013) Mohammad Ziaur Rahman   RENEWABLE & SUSTAINABLE ENERGY REVIEWS

Reliability assessment of ultra-thin HfO2 films deposited on silicon wafer

(2012) Wei-En Fu et al.   APPLIED SURFACE SCIENCE

Passivation Properties of Atomic-Layer-Deposited Hafnium and Aluminum Oxides on Si Surfaces

(2012) Jun Wang et al.   IEEE TRANSACTIONS ON ELECTRON DEVICES

Study of rapid thermal annealing on ultra thin high-k HfO2 films properties for nano scaled MOSFET technology

(2011) Vikram Singh et al.   MICROELECTRONIC ENGINEERING